| 摘要 |
PURPOSE:To electrically connect a dry plate with a charge beam exposure unit reliably, to eliminate the storage of charges on the plate during exposure and to obviate the drift of a pattern by providing an opening for a conductive pin which is to be brought into contact with a metal film on a photoresist film in the metal film. CONSTITUTION:When a charge beam exposure is conducted to form a pattern on a metal film 2 on a glass base 1, thereby manufacturing a mask and a reticle, an opening 7 for a conductive pin 5 to be brought into contact with the film 2 is provided in a photoresist film 4 formed on the film 2. For example, a metal layer 2 made of chromium or the like is formed on the base 1. Then, a coating material 3 made of a vinyl adhesive film or the like is coated in advance on the part to be brought into contact with the pin 5 in an exposure step. Thereafter, after the layer 2 is coated with an electron beam resist 4, the opening 7 is formed by removing the material 3, and the layer 2 of conductive substance is exposed. A dry plate 10A formed in this manner is subjected to a charge beam exposure, thereby forming the mask or the reticle. |
