PRODUCTION OF SUPERCONDUCTING THIN FILM

摘要

PURPOSE:To increase the critical current density of a thin film of a superconductor of a compd. oxide represented by a specified formula when the thin film is formed by physical vapor deposition by carrying out the physical vapor deposition at a prescribed rate of film formation. CONSTITUTION:A thin film of a compd. oxide superconductor is formed on a substrate by physical vapor deposition. The superconductor is based on a compd. oxide represented by the formula (where Ln is Tm and/or Lu and x=0-1) and the physical vapor deposition is carried out at 0.05-1Angstrom /sec rate of film formation.