METHOD AND APPARATUS FOR EPTAXIAL MANUFACTURE OF SEMICONDUCTOR DEVICE OR OBJECT WITH LAYERS

摘要

PURPOSE: To make the composition of a mixed gas quickly changeable without loss by changing the composition at every one or more cycles while the content of a gas pipette is periodically sent to a pulsating reactor by utilizing a pressure difference. CONSTITUTION: The gas components to be mixed with each other in a mixing chamber before the components are supplied to a pulsating reactor 1 are supplied to a gas pipette 9 through a line 10 under a pressure by opening a valve 11 and closing another valve 12. A mixing chamber is filled up with the gas components one cycle by one cycle by closing the valve 11 and opening the valve 12 after the pipette 9 is filled up with the gas components by opening the valve 11 and closing the valve 12. The content of the mixing chamber is supplied to the reactor 1 through a valve 2 while valves 3 and 6 are closed. The pipette 9 and the reactor 1 are simultaneously filled up with a new gas and the last formed mixed gas, respectively.