发明名称 PROCESS FOR CONDITIONING A DIELECTRIC SUBSTRATE FOR PLATING THEREON
摘要 A dielectric substrate is conditioned for plating from an electroless metal plating bath by providing the surface or surfaces of the substrate that are to be plated with semiconductor material whereby the semiconductor material, in the case of n-type material, exhibits energy band where the valence band is equal to or higher than and, in the case of p-type material, exhibits energy band where the valence band is equal to or lower than the redox potential of the metallic ions in the electroless plating bath that are to be deposited as metal on the substrate.
申请公布号 EP0271837(A3) 申请公布日期 1989.07.26
申请号 EP19870118383 申请日期 1987.12.11
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BINDRA, PERMINDER SINGH;CANAPERI, DONALD FRANCIS;DAVID, ALLAN PHILLIP;LIGHT, DAVID NOEL
分类号 C23C18/18;H05K3/18;(IPC1-7):C23C18/18 主分类号 C23C18/18
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