A COMBINED CONTINUOUS PLATING APPARATUS FOR HOT-DIP PLATING AND VACUUM DEPOSITION PLATING

摘要

The outlet of the gas reduction annealing furnace of a continuous hot dip plating apparatus is connected, through a pressurised chamber, to the inlet of the seal roll chamber of a continuous vacuum deposition plating apparatus. The pressurised chamber is detachable and is provided with a pressure regulation escape valve. The advantage is that each process can be selected by using the combined apparatus. In particular both single sided and double sided plating can be carried out, and platings of different thicknesses may be effected on each side of the strip. Thick platings may be carried out at high speeds.