| 摘要 |
PURPOSE:To keep spray of a treatment fluid from sticking to the surface of a substrate as well as to keep the other equipment clean, by rotating the substrate, by supplying a treatment fluid from above and by providing the upper part of a treatment area of an equipment with a chimney-like cover. CONSTITUTION:With a substrate 1 rotated, a treatment fluid is supplied from above. At the same time, the upper part of a treatment area of equipment for processing the surface of the substrate 1 is provided with a chimney-like cover 7. Splay 6 splashed by the semiconductor wafer 1 on a rotation chuck table 2 while it is rotated is exhausted from an exhaust hole 4 without sticking to the surface of the semiconductor wafer 1 and does not make the other equipment dirty by scattering outside since the upper part of the treatment area is provided with a chimney-like cover 7 to make an air flow smoothly from above toward the exhaust hole 4. |
