发明名称 |
Apparatus and method for manufacturing photosensitive amorphous silicon objects |
摘要 |
An apparatus for manufacturing photosensitive amorphous silicon objects comprises a pair of coaxial cylindrical electrodes inside a reaction tank of a plasma CVD device. A plurality of cylindrical substrates of an electrically conductive material disposed between these electrodes. A source gas is injected into the reaction tank through a plurality of inlets evenly spaced on the outer peripheral wall so that films of uniform quality can be produced efficiently.
|
申请公布号 |
US4851256(A) |
申请公布日期 |
1989.07.25 |
申请号 |
US19870131346 |
申请日期 |
1987.12.09 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
MATSUYAMA, TOSHIRO;KOJIMA, YOSHIMI;EHARA, SHAW |
分类号 |
C23C16/24;C23C16/509;C23C16/54;G03G5/08;G03G5/082;H01L31/20 |
主分类号 |
C23C16/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|