发明名称 RECESS ETCHING
摘要 <p>PURPOSE:To prevent a resist from being crushed to pieces when a probe is erected by a method wherein the part of resist mask whereon the probe is erected is coated with softer resist than that on the part of etching pattern. CONSTITUTION:The overall surface of a resist mask 7 is coated with a soft resist 8 to be exposed and developed for patterning so that a size larger region than the part whereon a probe is erected may be left. Next, the overall surface is coated with hard resist 9 to be exposed and developed for patterning and then the part whereon the probe 6 is erected is removed to expose the soft resist 8 simultaneously forming an etching pattern 5. Through these procedures, the probe 6 breaking through the resist mask 7 can be prevented from crushing the resist to pieces.</p>
申请公布号 JPH01184924(A) 申请公布日期 1989.07.24
申请号 JP19880009923 申请日期 1988.01.20
申请人 FUJITSU LTD 发明人 HAIRI ISAMU
分类号 H01L21/302;H01L21/306;H01L21/3065;H01L21/66 主分类号 H01L21/302
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