| 摘要 |
PURPOSE:To prevent deterioration of resolution, by performing proximity exposure of a substrate and a photo mask held vertically by respective holders. CONSTITUTION:A proximity exposure apparatus of the invention comprises a substrate holder 2 for holding a substrate 1 vertically, a mask holder 7 for holding vertically a photo mask 6 close to and parallel with the substrate 1 and an exposure optical system 10 for projecting parallel light rays vertically to the surface of the substrate 1 for exposing the mask pattern on the substrate 1. This exposure apparatus is adapted to perform exposure with the photo mask 6 and the substrate 1 disposed vertically. Accordingly, deflection of the photo mask 6 due to its own weight can be eliminated and the width of the gap defined between the substrate 1 and the photo mask 6 can be held at a predetermined value. Thus, deterioration of resolution can be prevented effectively even in a large-sized substrate. |
