| 发明名称 |
Ion implantation of zirconium alloys with hafnium |
| 摘要 |
An implantation method for the improvement of the corrosion resistance and hydrogen absorption resistance of zirconium alloys in a light water nuclear reactor environment includes the steps of sputtering a layer of hafnium ions onto a zirconium alloy and the implanting the hafnium ions with xenon doses of 3x1016 ions/cm2.
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| 申请公布号 |
US4849082(A) |
申请公布日期 |
1989.07.18 |
| 申请号 |
US19860825407 |
申请日期 |
1986.02.03 |
| 申请人 |
THE BABCOCK & WILCOX COMPANY |
发明人 |
BATY, DAVID L.;YOUNG, WILLIAM C.;LEWIS, DAVID E. |
| 分类号 |
C23C14/16;C23C14/14;C23C14/34;C23C14/48;C23C14/58;G21C3/07;G21C3/30 |
主分类号 |
C23C14/16 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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