发明名称 |
Pattern forming method using contrast enhanced material |
摘要 |
Disclosed is a pattern forming method using contrast enhanced material for enhancing the resolution and contrast when forming patterns in fabrication of semiconductors or the like. This pattern forming method comprises a step of applying a contrast enhanced material for pattern forming on a photoresist, a step of exposing and a step of developing. The contrast enhanced material is a water-soluble material using a novel diazo compound so that the coefficient A of the contrast may be 10 or more, and when it is combined with g-line exposure to be used in pattern formation, a pattern of 0.5 mu m or less may be formed. The diazo compound may be represented, for example, by <IMAGE>
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申请公布号 |
US4849323(A) |
申请公布日期 |
1989.07.18 |
申请号 |
US19870083199 |
申请日期 |
1987.08.10 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
ENDO, MASAYUKI;SASAGO, MASARU;OGAWA, KAZUFUMI |
分类号 |
G03F7/095;G03C1/00;G03F7/09;G03F7/11;H01L21/027 |
主分类号 |
G03F7/095 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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