发明名称 DETECTING SYSTEM FOR MARK IN CHARGE-BEAM EXPOSURE DEVICE
摘要 PURPOSE:To realize the operation of mark detection under the continuous movement of a sample, and to improve the productivity of the exposure device by temporarily interrupting the operation of mark detection during the updating of the quantity of deflection of main deflection. CONSTITUTION:The main-deflection aimed data of a memory 1 corresponds to the design coordinates of the mark. The main-deflection aimed data of a content memorized to the memory 1 and a result of counting of a counter 2 are added to value latched to a latch circuit 3 under the control of a control section 6 by an adder 4 as a first step for scanning the predetermined mark. A result of addition is arithmetically operated for correction by a correction circuit 5, and an input data to a main deflection amplifier 10 is determined. The value takes a stepped shape, and the aimed quantity of main deflection does not change until the latch circuit 3 is latched. On the other hand, the aimed quantity of sub-deflection is obtained by continuously inputting an output from a counter 7 to an adder 8, adding the output together with a content memorized to a memory 12 and correcting the strain of sub-deflection by a correction circuit 9. An output from the correction circuit 9 is inputted to a sub-deflection amplifier 11.
申请公布号 JPS58200536(A) 申请公布日期 1983.11.22
申请号 JP19820083631 申请日期 1982.05.18
申请人 NIPPON DENSHIN DENWA KOSHA 发明人 SHIMAZU NOBUO;MOROSAWA TETSUO;MURASHITA TATSU
分类号 H01L21/027;H01J37/304;(IPC1-7):01L21/30 主分类号 H01L21/027
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