发明名称 Method for modifying the surface of finely divided silica
摘要 In the present invention, finely divided silica is treated with two types of organosilican compounds, (i) organosilicon compound having the general formula <IMAGE> wherein R is a monovalent hydrocarbon group; n is an integer having a value of 0 to 10; and Q is an alkoxy group, halogen atom, or hydroxyl group, and (ii) organosilicon compound having the general formula (R3Si)a-Z wherein R is a monovalent hydrocarbon group; a is 1 or 2; when a equals 1, Z is a hydrogen atom, halogen atom, hydroxyl group, alkoxy group, -NR12, -ONR12, or -OCOR1; when a equals 2, Z is -O-or -NR1-; and R1 is the hydrogen atom or an alkyl group. The present invention characteristically affords a finely divided silica which has a high degree of surface treatment, which provides an elevated thixotropy when mixed with organopolysiloxane, and which provides stability in long-term storage.
申请公布号 US4849022(A) 申请公布日期 1989.07.18
申请号 US19880256143 申请日期 1988.10.11
申请人 TORAY SILICONE CO., LTD. 发明人 KOBAYASHI, HIDEKI;OHNISHI, MASAYUKI
分类号 C09C1/28;C08K9/06;C09C1/30 主分类号 C09C1/28
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