| 摘要 |
PURPOSE:To obtain excellent dimensional accuracy, pattern shape and heat resistance by incorporating a specific cresol novolak resin and photosensitizer into the title compsn. CONSTITUTION:The cresol novolak resin is obtd. from a mixture composed of 10-45wt.% m-cresol and 90-55wt.% p-cresol. The photosensitizer is the resultant product of the esterification reaction of at least one kind of polyhydroxybenzophenone among 2,3,4-trihydroxybenzophenones, 2,3,4,4'- tetrahydroxybenzophenones, and 2,2',4,4'-tetrahydroxybenzophenones and naphthoquinone diazide sulfonic acid contg. 1,2-naphthoquinone diazide-4-sulfonic acids 1,2-naphthoquinone diazide-5-sulfonic acids at 20:80-80:20 weight ratios and the content of triester and higher polyester is specified to >=80mol.%. The application to steppers for both G rays and I rays is thereby enabled and excellent dimensional accuracy and pattern shape are obtd. The fine patterns having the good heat resistance are thus formed. |
