| 摘要 |
PURPOSE:To form the light shield thin film of a colored set film accurately and economically in the gap of a transparent conductive pattern by causing the setting reaction of photosetting resin and the reaction between colorless dye and a developer. CONSTITUTION:Light shield thin films 3b, 3g, and 3r are formed on the transparent conductive pattern 2 provided on a transparent substrate 1, which is coated with the setting resin 4 containing the colorless dye and developer; and the resin is exposed from behind the transparent substrate 1, and unset parts of the setting resin 4 are removed. The colorless dye and developer are to react on each other by heating and thus colored reaction products are obtained to form the colored light shield thin film 7 in the gap of the transparent conductive pattern 2. Consequently, the high-accuracy light shield film 7 is formed economically in the gap of the transparent conductive pattern 2 of the transparent substrate 1. |
