Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester

摘要

A positive type photosensitive composition capable of improving the drawback in the conventional positive type photosensitive resin composition, improving adhesion between the positive type photoresist and the substrate and improving developability is provided by incorporating benzotriazole carboxylic acids in the positive type photoresist.