发明名称 DEVELOPING WASTE LIQUID PROCESSING MECHANISM
摘要 PURPOSE:To eliminate the need of the piping of a surplus developer, and also, to save the trouble for processing a waste liquid by containing the surplus developer after the development processing is executed, in a waste liquid pan and drying and evaporating a solvent component of the developer which is contained. CONSTITUTION:A surplus developer 75 discharged to a waste liquid pan 86 is heated by a heater 94, dried and a solvent component is evaporated. By this heating, the solvent component in the developer is dried and evaporated, and after it is evaporated, in the waste liquid pan 86, a toner particle in the developer remains behind as a solid body. An operator can process a waste liquid after the development by only eliminating this solidified toner particle. In such a way, a piping such as a return conduit line, etc., for returning the developer 75 after the development into a tank 64 becomes unnecessary. Also, whenever the development processing is executed once, the developer is contained in the waste liquid pan 86 and the solvent component is evaporated, therefore, it does not take time for processing the waste liquid.
申请公布号 JPH01173080(A) 申请公布日期 1989.07.07
申请号 JP19870335053 申请日期 1987.12.28
申请人 FUJI PHOTO FILM CO LTD 发明人 YODA AKIRA;SATO YOSHIMITSU
分类号 G03G15/11;G03G15/10 主分类号 G03G15/11
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