| 摘要 |
PURPOSE:To perform polishing work uniformly for the whole surface of a work of a large surface at a high efficiency by supplying polishing material sufficiently through the inside to flow out by centrifugal force if rotation speed and pressure are increased by supplying the polishing material from the center of a polishing table in working. CONSTITUTION:A back pressure unit 41 is actuated intermittently by a control unit so as to put up a pressure plate 12 to reduce pressing force to a work (a flat glass plate, for example) 7 intermittently. In this condition, polishing material 5 is supplied from a polishing material supplying unit 42 from a supply hole 51 opening at the center of a polishing table 11, so the polishing material is supplied through the whole surface of the work 7, thereby the whole surface of the work 7 can be polished uniformly and at a high efficiency. |
