| 摘要 |
<p>PURPOSE:To form a completely filled plane without any deviation between two kinds of film patterns by forming a lift material for a 2nd kind of film pattern prior to the formation of a 1st kind of film pattern by a lift-off method and forming a 1st kind of film pattern and a 2nd lift material pattern in a simultaneous stage. CONSTITUTION:The 1st kind of film 3 is formed at a specific position on a substrate 1 over the entire are including the pattern of a 1st lift material 2 and then the 2nd lift material 4 is formed over the entire area as well; and the 1st kind of film 3 and 2nd lift material 4 on the pattern of the 1st lift material 2 are lifted off by using liquid which dissolves only the 1st lift material 2, the 2nd kind of film 5 is formed over the entire area including the pattern of the 1st kind of film 3 and the pattern of the 2nd lift material 2 which are left as a result, and the 2nd kind of film 5 on the pattern of the 1st kind of film 3 is lifted off by using liquid which dissolves only the 2nd lift material 4, thereby forming a film pattern. Consequently, the constant surface area on the substrate is filled with the two kinds of film patterns in specific position relation without any overlap nor gap.</p> |
