发明名称 |
Photosensitive composition comprising a polymer with maleimido group in side chain and a diazo resin |
摘要 |
The present invention relates to a photosensitive composition suitable for the use in the preparation of a photosensitive lithographic plate. The photosensitive composition comprises (1) a polymer having a maleimido group in its side chain and being capable of being photocrosslinked, such as a copolymer of methyl methacrylate/N-[2-(methacryloyloxy)-ethyl]-2,3-dimethylmaleimide/metha crylic acid=15/65/20 (weight ratio) and (2) a diazo resin such as dodecylbenzenesulfonate of condensate of p-diazodiphenylamine and formaldehyde.
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申请公布号 |
US4845009(A) |
申请公布日期 |
1989.07.04 |
申请号 |
US19860908303 |
申请日期 |
1986.09.17 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KITA, NOBUYUKI;IMAI, MASANORI |
分类号 |
C08F299/00;C08F290/00;G03F7/021;G03F7/038 |
主分类号 |
C08F299/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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