| 摘要 |
PURPOSE:To treat the surface of a base body with the gaseous raw material generated from a solid raw material in a stable state with good reproducibility by constituting a surface treating device so that the solid raw material is sublimated in a cylinder regulated at temp. and the produced gaseous raw material is introduced into a treatment chamber held at vacuum. CONSTITUTION:Both a holder 2 for holding a base body 1 and regulating temp. and an introduction mechanism 70 for introducing a prescribed gaseous raw material into a vacuum treatment chamber 3 are provided in the chamber 3 and the inside of the chamber 3 is vacuumed and exhausted with an exhaust mechanism. Surface treatment of the base body 1 is performed by using an element or an atomic group constituting the prescribed gaseous raw material (e.g., AlCl3). In this case, a temp. regulation mechanism 20 for performing temp. regulation of the inside of a cylinder 35 containing a solid raw material 42 and producing the prescribed gaseous raw material is provided to the introduction mechanism 70. Further the chamber 3 and the cylinder 35 can be communicated via a value 32 and furthermore an agitation mechanism 40 for agitating solid 42 in the cylinder 35 is provided. Surface treatment such as film formation, growth of crystal and surface modification can be performed on the surface of the base material with good reproducibility by this surface treating device. |
