| 摘要 |
<p>A novel positive photoresist formulation is provided based on a 1:1 copolymer of maleimide and an aliphatic vinyl ether or ester in combination with a photoactive sensitizer capable of undergoing a change in aqueous alkaline solubility upon exposure to actinic radiation. The copolymers disclosed have structures of the type (I) where R is an alkyl substituent of from 1 to 20 carbon atoms, benzyl, C1 to C10 aralkyl, C3 to C12 cycloalkyl or formula (II), where R'' has the structures assigned to R, and where R' is independently H, C1 to C10 alkyl, phenyl, benzyl or C1 to C10 aralkyl. The polymers are compounded with a photoactive sensitizer capable of undergoing a change in aqueous alkaline solubility upon exposure to actinic radiation such as with diazonaphthoquinone sulfonic acid esters and amides. The polymer and sensitizer compositions are dissolved together in a solvent useful for spin casting of thin films on substrates.</p> |
