| 摘要 |
PURPOSE:To improve the sensitivity and resistance to dry-etching of a material for resist and to prevent generation of crack during development even when the material is applied to a thick film. CONSTITUTION:A material for resist contains 1-5wt.% azido compd. (A) and/or epoxy compd. (B) as an additive in an alpha-methyl styrene/'-methyl chloroacylate copolymer expressed by the formula. The components A, B function as a crosslinking agent and uncross-linked A, B function as plasticizer preventing the crack generation during development, but the effect is insufficient when the added amt. is below 1-5wt.%, and generation of negative image is caused if the amt. exceeds the above described range. In formula, l>=3; m<7; l+m=10; mol.wt. >=30,000. 4,4'-Diazido chalcone, etc. may be used in the component A, and glycidyl methacrylate may be used in the component B. |
