发明名称 |
Method for producing ultrathin metal film and ultrathin-thin metal pattern. |
摘要 |
<p>A responsive film containing a responsible group occuring a chemical reaction by energy beam is formed on an insulated substrate, and energy beam is irradiated in a pattern, and part of the responsive group is selectively deactivated or activated, and only the remaining portion of the responsive group of the responsive film is coupled with a chemical substance containing metal in a later process, and an ultrafine pattern of metal film is formed.</p> |
申请公布号 |
EP0322233(A2) |
申请公布日期 |
1989.06.28 |
申请号 |
EP19880312156 |
申请日期 |
1988.12.21 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
OGAWA, KAZUFUMI;TAMURA, HIDEHARU;MINO, NORIHASA |
分类号 |
G03F7/075;G03F7/26 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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