发明名称 Method of fabricating compound semiconductor laser using selective irradiation
摘要 Disclosed is a method of fabricating a compound semiconductor device which is capable of forming a multi-wavelength semiconductor laser structure, double cavity type semiconductor laser structure, stripe type semiconductor laser structure transverse junction stripe type semiconductor laser structure, or semiconductor grating by a single step of epitaxial growth while illuminating a desired part of substrate surface selectively with light at the time of epitaxial growth.
申请公布号 US4843031(A) 申请公布日期 1989.06.27
申请号 US19880168256 申请日期 1988.03.15
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 BAN, YUZABURO;TSUJII, HIRAAKI;SASAI, YOUICHI;OGURA, MOTOTSUGU;SERIZAWA, HIROYUKI
分类号 H01L33/00;H01S5/20;H01S5/40 主分类号 H01L33/00
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