发明名称 |
Method of fabricating compound semiconductor laser using selective irradiation |
摘要 |
Disclosed is a method of fabricating a compound semiconductor device which is capable of forming a multi-wavelength semiconductor laser structure, double cavity type semiconductor laser structure, stripe type semiconductor laser structure transverse junction stripe type semiconductor laser structure, or semiconductor grating by a single step of epitaxial growth while illuminating a desired part of substrate surface selectively with light at the time of epitaxial growth.
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申请公布号 |
US4843031(A) |
申请公布日期 |
1989.06.27 |
申请号 |
US19880168256 |
申请日期 |
1988.03.15 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
BAN, YUZABURO;TSUJII, HIRAAKI;SASAI, YOUICHI;OGURA, MOTOTSUGU;SERIZAWA, HIROYUKI |
分类号 |
H01L33/00;H01S5/20;H01S5/40 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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