| 摘要 |
An exposure apparatus for arranging an photomask having a plurality of alignment marks to face a surface to be exposed of a board having a plurality of corresponding alignment marks with the alignment marks of the photomask and the board being aligned to each other, to expose the board by radiating light through the photomask. The alignment marks of the board are different in size from the alignment marks of the photomask, whereby contours of the larger alignment marks encircle the smaller alignment marks when the board is overlapped with the photomask. In this state, the respective positions of the alignment marks of the board and the photomask are detected. The positions of the alignment marks thus detected are compared with each other to obtain displacement from desired positions, so that the photomask is moved in its surface direction to correct the displacement.
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