发明名称 FORMATION OF CARBON THIN FILM BY SPUTTERING
摘要 PURPOSE:To readily obtain carbon thin film with such excellent surface precision and strength as to be adequately put to practical use as a protective film for magnetic recording discs, by using a facing target-type sputtering means with the sputtering gas pressure at or below a specified level. CONSTITUTION:A voltage is applied on targets 3, 3 made of carbon, as the anode, arranged facing each other under a sputtering gas pressure of <=3.0m Torr to form a carbon thin film on the surface of a base plate 6 placed on the side of the magnetic field space 4 between said targets 3, 3. The sputtering gas is, e.g., argon or another inert gas. The sputtering gas pressure during sputtering operation has only to be set at <=3.0m Torr irrespective of the kind of the gas to be used.
申请公布号 JPH01160815(A) 申请公布日期 1989.06.23
申请号 JP19870318407 申请日期 1987.12.15
申请人 OSAKA SHINKU KIKI SEISAKUSHO:KK 发明人 NAOE MASAHIKO;HOSHI YOICHI;HIRATA TOYOAKI
分类号 C01B31/04;C23C14/06;C23C14/34;G11B5/73;G11B5/738;G11B5/84 主分类号 C01B31/04
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