发明名称 PHOTOGRAPHIC BASE
摘要 PURPOSE:To improve an antistatic property, flaw-resistant strength and corrosion resistance by providing a coating layer contg. at least either of chitin or chitosan and at least either of 2-hydroxy carboxylic acid and org. polybasic acid on the surface of a photographic hydrophobic base opposite to a photosensitive emulsion layer. CONSTITUTION:This photographic base has the back coat layer contg. at least either of the chitin and chitosan and at least either of the 2-hydroxy carboxylic acid and the org. polybasic acid on the surface (rear face) of the hydrophobic base opposite to the surface on which the photographic emulsion layer is disposed. The surface electric resistance is thereby lowered and the tough film property is provided to the base without adversely affecting various photographic characteristics and without impairing the antistatic property by the temp. and humidity during long-term preservation; in addition, deterioration of developing and fixing solns. is obviated.
申请公布号 JPH01159640(A) 申请公布日期 1989.06.22
申请号 JP19870319842 申请日期 1987.12.16
申请人 MITSUBISHI PAPER MILLS LTD 发明人 AIZAWA YASUHIRO
分类号 G03C1/85;G03C1/76;G03C1/79 主分类号 G03C1/85
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