发明名称 ORNAMENTATING METHOD BY SPUTTERING
摘要 PURPOSE:To prevent exfoliation of ornamental metallic films by forming the ornamental metallic films of different thicknesses in correspondence to an ornamental pattern mask on the surface of an article to be ornamented by using said mask, then bringing a base coat and top coat into direct contact with each other. CONSTITUTION:The ornamental pattern mask 15 provided with parts where splashed metals pass and the parts where said metals do not pass by varying the mesh or forming punching holes to a plate is prepd. The object 14 to be ornamented is, for example, the grill or garnish of an automobile and the base coat 17 of a resin is applied on the surface of a base material 16 made of an ABS resin. This surface is installed opposite to a cathode 13 of a sputtering device and the mask 15 is installed on the front face side of the base coat 17. Sputtering is then executed to form the metallic films 18-corresponding to the mask 15 partially on the surface of the base coat 17. The film thicknesses of the metallic films 18 are varied by the various densities of the mask 15 and further, the top coat 20 comes into tight contact with the surface of the base coat 17 when the surface is coated with the top coat 20 of a transparent resin.
申请公布号 JPH01159366(A) 申请公布日期 1989.06.22
申请号 JP19870316061 申请日期 1987.12.16
申请人 MITSUBISHI MOTORS CORP 发明人 MATSUMURA SHIGEKI
分类号 B32B7/04;B60R13/00;B60R19/52;C23C14/04 主分类号 B32B7/04
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