| 摘要 |
<p>PURPOSE:To make dry etching easy, to improve adhesiveness to a transparent substrate and to decrease the reflectivity of a mask by constituting a photomask material of the transparent substrate and carbonized metal formed on the transparent substrate. CONSTITUTION:A transition metallic film 3 consisting of carbonized molybdenum, tungsten, tantalum, etc., is formed to about 1,000Angstrom film thickness on the transparent glass substrate 1 consisting of quartz, etc. The carbonized film 3 can be easily formed by a sputtering method, etc. The reflectivity decreases as compared to the case in which an ordinary metallic silicide film is used as a mask material if the carbonizd metallic film is used as the mask material and therefore, the decrease in the resolution of the pattern by multiple reflections can be averted. The carbonized metal has the good adhesiveness to the transparent substrate, particularly to a quartz glass substrate and extends the life as a photomask. The etching of the film 3 is easily executed by a dry etching method.</p> |
