| 摘要 |
PURPOSE:To make control easy and accurate by forming a pattern for process time positioning related to the crystal orientation on a surface and a pattern for information display concerning a substrate. CONSTITUTION:A pattern 4 shows a crystal orientation and a pattern 5 which shows the quality of a wafer 1 is located at the outside of the pattern 4, i.e., near the circumference of the wafer. When a substrate is processed, the positioning of the wafer can be aligned by, e.g., an electrical positioning mechanism using an image sensor, an optical positioning mechanism using a laser scanning or the like. A pattern 6 for positioning is a V-shape and not only a vertical alignment but also a horizontal alignment can be done in high accuracy. This makes control easy and accurate.
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