| 摘要 |
PURPOSE:To balance a resist material between sensitivity and resolution and to provide high dry etching resistance by using a polymer having specified structural units. CONSTITUTION:This resist material is made of a polymer having structural units of a monomer represented by formula I. The polymer may be a homopolymer consisting of structural units of the monomer represented by the formula I or a copolymer having such structural units and structural units of other copolymerizable monomer. When the polymer is synthesized, the polymn. reaction system and conditions can be arbitrarily selected and bulk polymn., soln. polymn., suspension polymn. or emulsion polymn. may be adopted. The resist material made of the polymer maintains high resolution without reducing the mol. wt. and has high sensitivity and superior wear resistance. It is balanced between sensitivity and resolution and also has high dry etching resistance. |
