发明名称 METHOD AND DEVICE FOR CLEANING DEPOSITED FILM FORMING CHAMBER
摘要 PURPOSE:To remarkably reduce the cleaning time by vibrating a deposited film forming chamber, and releasing the contaminant stuck to the inner wall surface of the chamber. CONSTITUTION:A freely attachable and detachable vibrator 9 is brought into contact with a high-frequency electrode 5 in the deposited film forming device. The vibrator 9 is firstly kept out of contact with the electrode 5, a cylindrical carrier 4 is set as shown in the figure, the inside of the film forming chamber 1 is cleaned by hand, and then the inside of the chamber 1 is evacuated. A heater 3 is then energized to heat the surface of the carrier 4, a film forming gas is introduced through an inlet pipe 2, and the pressure is adjusted. A high-frequency power source 6 is then turned on, a discharge power is applied to generate an electric discharge, and a deposited film is formed on a substrate in the chamber 1. Since the contaminant is stuck to the inner wall surface of the chamber 1, the vibrator 9 is brought into contact with the electrode 5 and driven, hence the chamber 1 is vibrated while discharging the gas from an exhaust pipe 11, and the contaminant is released.
申请公布号 JPH01156484(A) 申请公布日期 1989.06.20
申请号 JP19870315094 申请日期 1987.12.15
申请人 CANON INC 发明人 KOIKE ATSUSHI;KIMURA TOMOHIRO;SHIRASAGO TOSHIYASU;KAWAMURA TAKAHISA;KUROKAWA TAKESHI
分类号 C23F4/00;G03G5/08 主分类号 C23F4/00
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