发明名称 |
Positive-working radiation-sensitive recording material with radiation-sensitive 1,2-quinone diazide underlayer and thicker positive-working radiation-sensitive overlayer |
摘要 |
A radiation-sensitive recording material comprising a support and first and second radiation-sensitive layers is disclosed. The first radiation-sensitive layer comprises a 1,2-quinone diazide as the radiation-sensitive compound and the second radiation-sensitive layer comprises (a) a compound which forms a strong acid under the action of actinic radiation, (b) a compound which has at least one acid-cleavable C-O-C bond and (c) a polymeric binder. The recording material has an improved storage stability as compared with materials which comprise only radiation-sensitive layers based on acid-cleavable compounds.
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申请公布号 |
US4840867(A) |
申请公布日期 |
1989.06.20 |
申请号 |
US19870063070 |
申请日期 |
1987.06.17 |
申请人 |
HOECHST AKTIENGESELLSCHAFT |
发明人 |
ELSAESSER, ANDREAS;RODE, KLAUS |
分类号 |
G03F7/022;G03C1/72;G03F7/095 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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