| 摘要 |
The wet processing appts. for a planar substrate comprises a chamber (13) formed by a pedestal (11) and lid (12), an opening (15) at the pedestal center for injection of processing liquid, with nozzles (16) around the opening and inclined with respect to the substrate so that the liq. rotates the substrate. The liquid is supplied to each nozzle via a trench (17') with a second opening (17) for liquid supply. The lid has a third opening for injection of processing liquid, and outlet opening in the lid periphery for overflow of the liquid. There is pref. a peripheral O-ring to seal between the pedestal and the lid, and the liq. is pumped from a storge tank to the three inlet openings via control valves.
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