发明名称 Plasma X-ray source
摘要 A plasma X-ray source in which a discharge tube containing a pair of coaxial cylindrical electrodes is filled with a gas, a high voltage pulse from a charged capacitor is applied between the cylindrical electrodes to convert the gas into a plasma, the plasma is focused on a position near the end of the inner one of the cylindrical electrodes to generate X-rays, and the X-rays thus generated are emitted to the outside of the discharge tube through a window provided thereon, is disclosed. In the above X-ray source, the high voltage pulse is applied between the cylindrical electrodes so that the inner cylindrical electrode is at a negative potential with respect to the outer cylindrical electrode.
申请公布号 US4841556(A) 申请公布日期 1989.06.20
申请号 US19870012992 申请日期 1987.02.10
申请人 HITACHI, LTD. 发明人 KATO, YASUO;OCHIAI, ISAO;WATANABE, YOSHIO;MURAYAMA, SEIICHI
分类号 H01J35/22;H01L21/027;H01L21/30;H05G2/00 主分类号 H01J35/22
代理机构 代理人
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