| 摘要 |
PURPOSE:To obtain a gauge capable of calibrating the position of an exposure light source quickly under conditions including changes in the temperature of a shadow mask by providing a plurality of screens on part of a panel-shaped main body so that the screens can be observed with multiple microscopes. CONSTITUTION:First, the temperature of a heater 9 is set on an exposure device main body 3 in coincidence with the panel temperature during the resist exposure. Next, the luminescent rays of a light source 4 are selected in color by shadow mask holes 2H through an optical system 15, and the shapes of the shadow mask holes 2H are projected on screens 10. The shape of the shadow mask hole 2H projected on the screen is observed with a microscope 11, and a variable cursor 11c is matched with this position and is stored. Then, a phosphor exposure device paired with the exposure device main body 3 is set, and the temperature of the heater 9 is matched with the panel temperature when the phosphor is exposed, and the position of the light source 4 is adjusted so that the image position generated on the screen by the radiation rays from the light source 4 coincides with that of said exposure device. |
