发明名称 SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 <p>PURPOSE:To dye with desired density irrespective of conditions, such as the thickness of a film to be dyed, the density and temperature of dye solution, etc., by dipping a glass wafer with the film to be dyed in the solution, passing light therethrough to allow it to receive the light, and controlling the dye on the basis of the density of the film to be dyed. CONSTITUTION:A glass wafer 3 partly coated with a film to be dyed is conveyed together with a carrier 2 which supports the wafer by a conveying arm 11 to a dye tank 1, and dipped in dye solution. Light set to a desired wavelength is radiated from a variable wavelength light source 6, split by a half mirror 4 into two beams, one of which is rectilinearly propagated, and the other of which is rectilinearly propagated in parallel with the previous light by a mirror 5. One of two beams of the split light is passed through a film 3a to be dyed, and the other is passed through a transparent section 3b to be detected by photodetectors 7, 8, and the transmittivity of the film 3a to be dyed is calculated by an arithmetic unit 9 on the basis of the detected amounts. When the calculated transmittivity becomes a desired value, the arm 11 is operated by a signal from a controller 10, the carrier 2 and the wafer 3 are lifted from the tank 1, thereby completing a dying work.</p>
申请公布号 JPH01154568(A) 申请公布日期 1989.06.16
申请号 JP19870312249 申请日期 1987.12.11
申请人 NEC CORP 发明人 YONEYAMA MASAHIRO
分类号 G02B5/20;H01L27/14;H01L31/02 主分类号 G02B5/20
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