| 摘要 |
PURPOSE:To prevent the trouble in carrying a mask arising from a change in the outside shape of a pellicle surface and the deterioration in optical characteristics while preventing intrusion of dust therein by providing an aperture to at least a part of a pellicle frame and covering the aperture with a filter. CONSTITUTION:The pellicle 12 is adhered to the pellicle frame 13; further, this pellicle frame 13 is adhered and fixed to the photomask 11. One aperture 15 is provided by machining to the side face of the pellicle frame 13 and further, the aperture 15 is covered by the filter 16 on the outside surface side of the pellicle frame 13. Air permeability is, therefore, provided to the hermetic part 14 enclosed by the photomask 11, the pellicle 12 and the pellicle frame 13 so that the vertical movement of the pellicle 12 surface by a change in the atm. pressure is suppressed. Since the aperture 15 is covered by the filter 15, the intrusion of the dust from this aperture is prevented. The trouble in carrying the mask arising from the change in the outside shape of the pellicle surface and the deterioration in the optical characteristics are thereby prevented while the intrusion of the dust is prevented. |
