Interferometric measuring system having a wavelength correcting device for the laser light, in particular for length measurements

摘要

An interferometric measuring system having a wavelength correction device for the laser light, in particular for length measurements on measuring instruments or machine tools is described, which comprises an interferometer beam path and a correction beam path (3), in which there is arranged at least one multiple Fizo interferometer which serves as a correction device and has an assigned element which varies the beam cross-section. A photoreceiver cell (17) for scanning the interference fringes is arranged downstream of the multiple Fizeau interferometer. Corrected measured values are determined by an evaluation unit (24) or computer from correction signals and the signals of the provided length measuring interferometer (6).