METHOD AND DEVICE FOR THE PRODUCTION OF A UNIFORM PLASMA HAVING A LARGE VOLUME, A HIGH DENSITY AND A LOW ELECTRON TEMPERATURE

摘要

The invention relates to the production of plasma. The process according to the invention comprises the steps of: maintaining a gaseous medium in an enclosure at a pressure in the range of 10-5 to 10-1 Torr; exciting this gaseous medium in the enclosure by means of UHF waves in the range of one to ten gigahertz, producing a plasma; and maintaining this plasma in the enclosure by means of a magnetic confinement shell comprising many elongated magnetic elements arranged parallel to each other inside the enclosure near the respective interior surfaces, the faces of the magnetic elements which face the interior of the enclosure having alternating polarities. It is more particularly applicable to the microelectronics industry.