发明名称 DEPOSITION OF MATERIALS IN A DESIRED PATTERN ON TO SUBSTRATES
摘要 <p>A localised charge pattern is written on the surface of an insulating substrate (1) using an electron gun (3, 4, 5, 6). Subsequently, a metallic layer is preferentially deposited on the charged regions by means of a vaporising filament (7).</p>
申请公布号 WO1989005361(A1) 申请公布日期 1989.06.15
申请号 GB1988001060 申请日期 1988.12.05
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