发明名称 PHOTORESIST DEVELOPING LIQUID
摘要 PURPOSE: To make a developing soln. substantially free from metal ions by incorporating quat. ammonium hydroxide and N,N-dialkylalkanolamine as active components and specifying the weight ratio between them and the total concn. CONSTITUTION: This developing soln. is an aq. soln. of a positive type photoresist developer contg. quat. ammonium hydroxide and N,N- dialkylalkanolamine as active components. The pref. weight ratio between the former and latter is 10:1 to 1:20, especially 1:1 to 1:10. The pref. total amt. of them in the soln. is 1-30wt.%, especially 4-12wt.%. This developing soln. has a very low metal ion content and it is unnecessary that expensive deionized water is used so as to remove a trace of metal ions.
申请公布号 JPH02151866(A) 申请公布日期 1990.06.11
申请号 JP19880292539 申请日期 1988.11.21
申请人 MACDERMID INC 发明人 AREN SHII SUPENSAA
分类号 G03F7/022;G03F7/32 主分类号 G03F7/022
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