发明名称 Vapour phase treatment process and apparatus
摘要 A process for treating workpieces in a normally closed treatment chamber. The process comprises providing a pressure within the chamber which is less than atmospheric and providing an unsaturated treatment vapor within the chamber. A workpiece is then moved into the chamber to be treated by the unsaturated vapor. The process is particularly suited for the vapor phase soldering of printed circuit boards. The unsaturated vapor in the chamber is heated to a temperature higher than the melting point of the solder used and the circuit boards with solder thereon are passed through the vapor in the chamber to reflow the solder. The invention is also directed toward an apparatus for carrying out the process.
申请公布号 US4838476(A) 申请公布日期 1989.06.13
申请号 US19870119567 申请日期 1987.11.12
申请人 FLUOCON TECHNOLOGIES INC. 发明人 RAHN, ARMIN
分类号 B23K1/015;B23K1/00;C23C14/56;C23G5/04;H05K3/34 主分类号 B23K1/015
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