| 摘要 |
PURPOSE:To enable the correct focussing process to be maintained reducing the operation rate of a projection exposure device by a method wherein the alignment slippage amount of a focussing mechanism resulting from the time elapsing change of environmental requirements after setting up the first reference is corrected. CONSTITUTION:A focus detecting sheet 42 with a fine transparent window 41 is provided on a substrate stage 20 in parallel with an exposure surface 2 of a substrate 1 to be exposed and simultaneously a shielding pattern 6 with a fine transparent region 5 is provided on a photo mask 3. Next, the focus detecting sheet 42 is aligned by shifting the focus detecting sheet 42 using the substrate stage 20 as well as shifting the photo mask 3 in parallel with the pattern thereof so that the intensity of the light flux 13 from a fine transparent region 5 passing through the fine transparent window 41 may be maximized by a projection optical system 10 to bring about the state wherein the nearby part of the fine transparent window 41 is irradiated with the incident light flux 32 of a focussing optical system 30. The adjusting point of this adjusting mechanism 35 is assumed as the second reference. Through these procedures, the focus detecting sheet 42 is aligned at proper times during the exposure process to check the slippage amount of the adjusting point of the adjusting mechanism 35 from the second reference said state for correcting the first reference by the slippage amount. |
