发明名称 |
BEAM PROFILER |
摘要 |
PURPOSE:To have high precision measurement by combining micro-electrodes in rows with slits. CONSTITUTION:An ion beam 112 generated by an ion source 10 reaches an electrode 22 as part of a beam profiler via a slit 14. This electrode 22 is composed of a number of micro-electrodes 18 consisting of very small conductive parts and insulating parts arranged alternately. The slit 14 as part of beam profiler has a width approx. the same as that of conductive part 18 and is movable in the direction 15 perpendicular to the beam stream in the position that the ion beam 16 stream after passing the slit 14 is intersected. This enables processing of an electrode in simple construction and with small pitch as well as measurement with high resolution.
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申请公布号 |
JPH01149352(A) |
申请公布日期 |
1989.06.12 |
申请号 |
JP19870307242 |
申请日期 |
1987.12.04 |
申请人 |
TOPPAN PRINTING CO LTD;RES DEV CORP OF JAPAN |
发明人 |
NISHITANI MIKA;YASUJIMA HIROYUKI |
分类号 |
H01J37/141;G01T1/29;H01J37/04;H01J37/09 |
主分类号 |
H01J37/141 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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