| 摘要 |
PURPOSE:To obtain a good optical disk by solubilizing a photoresist in a developing soln. with a photomask which allows photoirradiation to parts except pit- forming parts, then removing the resist and forming pits on the surface of the glass substrate by etching. CONSTITUTION:The photoresist 20 is solubilized in the developing soln. with the photomask 15 which allows the photoirradiation to the parts except the pit-forming parts and is then removed at the time of exposing the photoresist 20 of a positive type coated on the glass substrate 19. The resist is then removed and the pits 21 are formed directly as ruggedness of the glass by etching on the surface of the glass substrate 19. The tight contact of the photomask and the photoresist is thereby easily inspected when the photomask and the photoresist are brought into tight contact with each other. The high-quality optical memory element is thus formed.
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