发明名称 FORMING OF POLYACETYLENE
摘要 PURPOSE:To obtain the title polymer free from internal strain and useful for molecular devices, etc., at a high reaction rate, by forming a monomolecular film of a straight-chain hydrocarbon having chlorosilane group at an end of the main chain and acetylene group at an arbitrary part of the main chain or the side chain and polymerizing the formed monomolecular film. CONSTITUTION:A hydrophilic film 2 (e.g., SiO2 film) is applied to a surface of a substrate 1 (e.g., Si substrate). A monomolecular film 6 is formed on the hydrophilic film by using a plural number of straight-chain hydrocarbon molecules 3 having one or more side chains, a chlorosilane group at one end of the main chain and one or more acetylene groups 4, 4' between arbitrary carbon-carbon bond on the main chain or side chain as a group sensitive to the energy of light, heat, electron ion, etc. An energy beam of e.g., light, heat or electron ion is radiated to the sensitive group to effect the polymerization of the straight-chain hydrocarbon molecule and obtain the objective polyacetylene 8.
申请公布号 JPH01149809(A) 申请公布日期 1989.06.12
申请号 JP19870309054 申请日期 1987.12.07
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MINO NORIHISA;OGAWA KAZUFUMI
分类号 H01L51/05;C08F38/00;C08J5/18;H01B1/12;H01L51/00;H01L51/40 主分类号 H01L51/05
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