| 摘要 |
PURPOSE: To enable water-based alkali development for exposure with an excimer laser by using a specified diazotetronic acid as an optically active component so as to improve solubility characteristics and decolorizing behavior. CONSTITUTION: The diazotetronic acid expressed by formula I forms a photosensitive mixture of a polymer and an optically active component, and its optical activity gives good decolorizing behavior. A positive DUV photoresist which does not volatilize from the resist layer during a drying process and can be developed with a water-based alkali developer for exposure with a KrF excimer laser can be obtd. In formula I, R is H or alkyl, cycloalkyl, aryl or silicon-contg. group. At least one of R is an aliphatic or aromatic group having another diazotetronic group. Or, one of R is a single bond to directly bond the diazotetronic group to the polymer, or an alkylene group, arylene group or bivalent siliconcontg. group bonded to the polymer. |
