发明名称 |
NEGATIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE:To obtain a resist compsn. hardly generating fine particles by dissolving an alkali-soluble resin and an azido compd. in a solvent contg. monoxymonocarboxylic esters. CONSTITUTION:An alkali-soluble resin and an azido compd. are dissolved in a solvent contg. monoxymonocarboxylic esters. The solvent is desirably a compd. represented by a formula R1O-R2-COOR3 (where R1 is H or 1-3C alkyl, R2 is 1-4C alkylene and R3 is 1-4C alkyl). A resin compsn. capable of reducing the number of fine particles generated and hardly undergoing a change in the performance as a resist can be obtd. |
申请公布号 |
JPH01145649(A) |
申请公布日期 |
1989.06.07 |
申请号 |
JP19880262031 |
申请日期 |
1988.10.18 |
申请人 |
JAPAN SYNTHETIC RUBBER CO LTD |
发明人 |
HOSAKA YUKIHIRO;NOZUE IKUO;TAKATORI MASASHIGE;HARITA YOSHIYUKI |
分类号 |
G03C1/00;G03F7/004;G03F7/008 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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