发明名称 NEGATIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain a resist compsn. hardly generating fine particles by dissolving an alkali-soluble resin and an azido compd. in a solvent contg. monoxymonocarboxylic esters. CONSTITUTION:An alkali-soluble resin and an azido compd. are dissolved in a solvent contg. monoxymonocarboxylic esters. The solvent is desirably a compd. represented by a formula R1O-R2-COOR3 (where R1 is H or 1-3C alkyl, R2 is 1-4C alkylene and R3 is 1-4C alkyl). A resin compsn. capable of reducing the number of fine particles generated and hardly undergoing a change in the performance as a resist can be obtd.
申请公布号 JPH01145649(A) 申请公布日期 1989.06.07
申请号 JP19880262031 申请日期 1988.10.18
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 HOSAKA YUKIHIRO;NOZUE IKUO;TAKATORI MASASHIGE;HARITA YOSHIYUKI
分类号 G03C1/00;G03F7/004;G03F7/008 主分类号 G03C1/00
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